KUMAR, A.; LEE, W.-H. A Novel Process for SiGe Core-Shell JAM Transistors Fabrication and Thermal Annealing Effect on Its Electrical Performance. Semiconductor Science and Information Devices, [S. l.], v. 1, n. 2, p. 11–18, 2020. DOI: 10.30564/ssid.v1i2.1399. Disponível em: https://journals.bilpubgroup.com/index.php/ssid/article/view/1399. Acesso em: 3 may. 2024.